nanolithography

基本解释

The projection electron beam lithography with angular limitation(PEBL)is potentially one of the most attractive techniques for nano lithography in the21st Century.
具有角度限制的电子束投影曝光技术有可能成为21世纪最有潜力的纳米光刻技术之一。
Nano lithography technology plays a very important role in the field of nano electronic manufacturing, while e beam lithography is one of the best ways to produce nano features.
纳米光刻技术在微电子制作中起着关键作用，而电子束光刻在纳米光刻技术制作中是最好的方法之一。
These techniques include molecular assembly, arrangement of nano particles, scanning force microscopy fabrication and nano lithography based on photon beam, electron beam, and ion beam.
结果对基于分子组装与纳米光刻的纳料制造技术给予很大的重视。

Chou can use his Nano-Imprint Lithography technique for semiconductor markets to make designs and chips.
FORBES: Adviser Soapbox